CONTROL OF MANUFACTURING MULTILAYER NARROWBAND LIGHT FILTERS AT MULTIPLE WAVELENGTHS

Abstract

The study is devoted to the problem of controlling the production of multilayer narrow-band light filters at multiple wavelengths and determining the errors that arise during the production of interference light filters by the method of extreme control. This problem becomes particularly acute with multilayered substrates and multiple wavelengths and can lead to the release of defective batches of product if not addressed.

To restore the above error, during the writing of the article, an experimental application of a multilayer Ge coating on a number of K8 glass samples was carried out and their geometric thickness was measured. Using the Airy formula and the Swanepoel method, the refractive index (n), absorption coefficient (k) and geometric film thickness (d) were determined, on the basis of which a table was created that reflects the change in these indicators depending on the duration of the sputtering wavelength and allows you to find the search error of sputtering.

The work considers the change in the real parameters of light filters from those simulated during their manufacture by the extreme control method at multiple wavelengths. A graph is presented that reflects the simulated target result. Based on the results of the calculations, the relative sputtering error, which is the desired deviation, is derived.